LOW-COST LIQUID-PHASE EXFOLIATION OF MOLYBDENUM DISULFIDE (MOS2) FOR DEVICE APPLICATIONS

Publicado em 27/05/2026 - ISBN: 978-65-272-2467-9

Título do Trabalho
LOW-COST LIQUID-PHASE EXFOLIATION OF MOLYBDENUM DISULFIDE (MOS2) FOR DEVICE APPLICATIONS
Autores
  • Nicolli De Freitas
  • Ana Elisa da Silva Lima
  • Gustavo Oliveira Silva
  • Maria Luisa Braunger
  • João Batista Souza Junior
  • Rafael Furlan de Oliveira
Modalidade
Pôster - resumo
Área temática
Dispositivos eletrônicos, eletroquímicos, supercapacitores e baterias
Data de Publicação
27/05/2026
País da Publicação
Brasil
Idioma da Publicação
pt-BR
Página do Trabalho
https://www.even3.com.br/anais/workshop-do-ineo-2026/1464882-low-cost-liquid-phase-exfoliation-of-molybdenum-disulfide-(mos2)-for-device-applications
ISBN
978-65-272-2467-9
Palavras-Chave
MoS2, device, 2DM-inks, HSM
Resumo
Globally, the demand for novel materials for advanced technological application has increased significantly. In this regard, two-dimensional materials (2DMs), such as graphene and molybdenum disulfide (MoS2), have emerged as versatile platforms owing to their unique physico-chemical properties. However, the scalable production of high-quality, few-layer dispersion for thin-film applications remains a challenge, particularly regarding process simplicity, cost-effectiveness and environmental safety. Liquid phase exfoliation (LPE) represents a promising strategy for formulating 2DM-inks. LPE depends on the interplay between the bulk precursor, the solvent, and the applied force to overcome Van der Waals forces and prevent reaggregation of the nanosheets. While various techniques such as ultrasound-induced LPE (UILPE), high-shear mixing (HSM), microfluidization, and electrochemical exfoliation (EE) offer distinct advantages, they also presents trade-offs. For instance, UILPE typically yields thinner and smaller nanosheets, but commonly results in structural defects. Conversely, HSM produces larger, thicker flakes while offering a highly scalable system. Consequently, this project aims to establish a robust platform for producing exfoliated MoS2 inks, specially investigating HSM parameters, solvents interactions, and blade geometries. Acknowledgments: The authors acknowledge financial support from the Ministry of Science, Technology and Innovation of Brazil (MCTI), Brazilian Center for Research in Energy and Materials (CNPEM), the Sao Paulo Research Foundation (FAPESP, grant numbers 2021/06238-5, 2023/09395-0, 2024/00989-7, 2023/13081-0), and INCT/INEO (CNPQ - 408449/2024-1, FAPESP - 2025/27044-5). References: [1] S. Witomska, T. Leydecker, A. Ciesielski, P. Samorì, Adv. Funct. Mater. 29 (2019) 1901126. [2] P. G. Karagiannidis, S. A. Hodge, L. Lombardi, F. Tomarchio, N. Decorde, S. Milana, I. Goykhman, Y. Su, S. V. Mesite, D. N. Johnstone, R. K. Leary, P. A. Midgley, N. M. Pugno, F. Torrisi, A. C. Ferrari, ACS Nano 2017, 11, 2742. [3] N. de Freitas, B. R. Florindo, V. M. S. Freitas, M. H. O. Piazzetta, C. A. Ospina, J. Bettini, M. Strauss, E. R. Leite, A. L. Gobbi, R. S. Lima and M. Santhiago, Nanoscale, 2022, 14, 6811–6821.
Título do Evento
Workshop do INEO 2026
Cidade do Evento
Nazaré Paulista
Título dos Anais do Evento
Anais do Workshop do INEO 2026
Nome da Editora
Even3
Meio de Divulgação
Meio Digital

Como citar

FREITAS, Nicolli De et al.. LOW-COST LIQUID-PHASE EXFOLIATION OF MOLYBDENUM DISULFIDE (MOS2) FOR DEVICE APPLICATIONS.. In: Anais do Workshop do INEO 2026. Anais...Nazaré Paulista(SP) Hotel Estância Atibainha, 2026. Disponível em: https//www.even3.com.br/anais/workshop-do-ineo-2026/1464882-LOW-COST-LIQUID-PHASE-EXFOLIATION-OF-MOLYBDENUM-DISULFIDE-(MOS2)-FOR-DEVICE-APPLICATIONS. Acesso em: 11/08/2026

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