FABRICATION OF INTERDIGITATED ELECTRODES BY PHOTOLITHOGRAPHY

MARCUS VINICIUS GOMES DAMACENO; Juscelino Valter Barbosas Junior; Andreia Macedo

Todos os Trabalhos

Trabalho

Título do Trabalho

FABRICATION OF INTERDIGITATED ELECTRODES BY PHOTOLITHOGRAPHY

Autores

MARCUS VINICIUS GOMES DAMACENO
Juscelino Valter Barbosas Junior
Andreia Macedo

Modalidade

Pôster - resumo

Área temática

Dispositivos eletrônicos, eletroquímicos, supercapacitores e baterias

Data de Publicação

27/05/2026

País da Publicação

Brasil

Idioma da Publicação

pt-BR

Página do Trabalho

https://www.even3.com.br/anais/workshop-do-ineo-2026/1462636-fabrication-of-interdigitated-electrodes-by-photolithography

ISBN

978-65-272-2467-9

Palavras-Chave

Interdigitated electrodes; Photolithography; Negative photoresist; Sensors; Microfabrication

Resumo

Fabrication of Interdigitated Electrodes by Photolithography Marcus Vinicius Gomes Damaceno , Juscelino Walter Barbosa Junior , Andreia Gerniski Macedo Licenciatura em Física, UTFPR - Campus Curitiba, Brasil marcusdamaceno@alunos.utfpr.edu.br Abstract Interdigitated devices (IDEs) are widely employed in resistive and capacitive sensors due to their high sensitivity, geometric simplicity, and ease of integration with different active materials. These devices are particularly relevant in applications involving graphene-based materials in organic electronics and are frequently used in chemical, biological, and environmental sensors. In this work, the fabrication of interdigitated electrodes using a conventional photolithography process is presented. A commercial negative photoresist kit (Negative Photoresist Kit, Sigma-Aldrich) was employed and applied to previously cleaned substrates. The choice of a negative photoresist is justified by its good resolution and stability during subsequent processing steps. The photolithographic process involved the deposition of the negative photoresist by spin coating, ensuring the formation of a uniform film on the substrate. This was followed by a pre-bake step aimed at removing residual solvents and improving film adhesion. Ultraviolet radiation exposure was carried out through a photomask containing the interdigitated pattern, promoting photoresist crosslinking in the exposed regions. After development, the exposed areas remained on the substrate, acting as a protective mask during the selective chemical etching of the aluminum layer in the unprotected regions. Finally, the remaining photoresist was removed, resulting in the final definition of the interdigitated structure. The fabricated devices exhibited good reproducibility, high geometric control, and well-defined metallic tracks, which are essential characteristics for applications in sensors and microelectronic devices. The results demonstrate that photolithography is a well-established, reliable, and efficient technique for the fabrication of IDEs, being particularly suitable for experimental applications in microfabrication and electronics. Acknowledgments The authors gratefully acknowledge the Federal University of Technology – Paraná (UTFPR) for providing the infrastructure and institutional support necessary for the development of this work. The authors also acknowledge the Instituto Nacional de Eletrônica Orgânica (INEO) for scientific and institutional support. Financial support from the São Paulo Research Foundation (FAPESP) is acknowledged under process no. 2025/27044-5, as well as support from the National Council for Scientific and Technological Development (CNPq) under process no. 408449/2024-1. REFERENCES [[1]MDPI Technologies. Advances in Photolithography and Photoresist Materials. Technologies, 6(4), Article 13, 2024.https://doi.org/10.3390/technologies6040013 [2] Indian Academy of Sciences. Photolithography and Photoresists. Resonance – Journal of Science Education, Indian Academy of Sciences, Bangalore, India. [3]Shaw, G. A. The Physics and Chemistry of Photoresist Materials. IBM Journal of Research and Development, 29, 1985, pp. 381–395.

Título do Evento: Workshop do INEO 2026
Cidade do Evento: Nazaré Paulista
Título dos Anais do Evento: Anais do Workshop do INEO 2026
Nome da Editora: Even3
Meio de Divulgação: Meio Digital

Como citar

DAMACENO, MARCUS VINICIUS GOMES; JUNIOR, Juscelino Valter Barbosas; MACEDO, Andreia. FABRICATION OF INTERDIGITATED ELECTRODES BY PHOTOLITHOGRAPHY.. In: Anais do Workshop do INEO 2026. Anais...Nazaré Paulista(SP) Hotel Estância Atibainha, 2026. Disponível em: https//www.even3.com.br/anais/workshop-do-ineo-2026/1462636-FABRICATION-OF-INTERDIGITATED-ELECTRODES-BY-PHOTOLITHOGRAPHY. Acesso em: 10/08/2026